Patent Number: 7,825,377

Title: Electron beam apparatus with aberration corrector

Abstract: An electron beam apparatus with an aberration corrector using multipole lenses is provided. The electron beam apparatus has a scan mode for enabling the operation of the aberration corrector and a scan mode for disabling the operation of the aberration corrector and the operation of each of the aberration corrector, a condenser lens, and the like is controlled such that the object point of an objective lens does not change in either of the scan modes. If a comparison is made between the secondary electron images of a specimen in the two modes, the image scaling factor and the focus remain unchanged and evaluation and adjustment can be performed by distinctly recognizing only the effect of the aberration corrector. This reduces the time required to adjust an optical axis which has been long due to an axial alignment defect inherent in the aberration corrector and an axial alignment defect in a part other than the aberration corrector which are indistinguishably intermingled with each other.

Inventors: Kawasaki; Takeshi (Musashino, JP), Yoshida; Takaho (Kodaira, JP), Ose; Yoichi (Mito, JP), Todokoro; Hideo (Hinode, JP)

Assignee: Hitachi High-Technologies Corporation

International Classification: G21K 1/08 (20060101); H01J 3/14 (20060101)

Expiration Date: 2019-11-02 0:00:00