Patent Number: 7,825,390

Title: Apparatus with plasma radiation source and method of forming a beam of radiation and lithographic apparatus

Abstract: An apparatus for forming a beam of electromagnetic radiation includes a plasma radiation source, and a foil trap provided with a plurality of thin foils that extend substantially parallel to the direction of radiation from the plasma source. A grid is disposed between the plasma radiation source and the foil trap. A space is located between the grid and the foil trap. The apparatus also include an electrical potential application circuit that is constructed and arranged to apply an electrical potential to the grid so that the grid repels electrons emitted by the plasma radiation source and creates a positive space charge between the grid and the foil trap to deflect ions emitted by the plasma radiation source to the foil trap.

Inventors: Krivtsun; Vladimir Mihallovitch (Troitsk, RU), Banine; Vadim Yevgenyevich (Helmond, NL), Ivanov; Vladimir Vitalevich (Moscow, RU), Korop; Evgeny Dmitrievich (Troitsk, RU), Koshelev; Konstantin Nikolaevich (Troitsk, RU), Sidelnikov; Yurii Victorovitch (Troitsk, RU), Yakushev; Oleg (Korolev of Moscow region, RU)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/42 (20060101)

Expiration Date: 2019-11-02 0:00:00