Patent Number: 7,826,030

Title: Lithographic apparatus and device manufacturing method

Abstract: A system to recycle immersion fluid in an immersion fluid lithographic apparatus is described. A recycling path comprising a plurality of parallel paths, each of which has its own parallel liquid treatment unit optimized to treat fluid which is directed through it, is disclosed.

Inventors: Mulkens; Johannes Catharinus Hubertus (Waalre, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/52 (20060101); G03B 27/42 (20060101); G03B 27/32 (20060101); G03B 27/58 (20060101)

Expiration Date: 2019-11-02 0:00:00