Patent Number: 7,826,035

Title: Lithographic apparatus and device manufacturing method

Abstract: An array of individually controllable elements includes elements, each formed of a stack of layers of dielectric material. At least one layer is an electro-optical material. The at least one layer's refractive index for radiation that is plane polarized in a given direction can be changed by application of a voltage in order to change the reflection/transmission characteristic of the boundary between this layer and the adjacent layer.

Inventors: Bleeker; Arno Jan (Westerhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/54 (20060101)

Expiration Date: 2019-11-02 0:00:00