Patent Number: 7,826,044

Title: Measurement method and apparatus, and exposure apparatus

Abstract: A measurement method for measuring an optical characteristic of a target optical system includes the steps of introducing a light from each of plural patterns that reduce diffracted lights other than a predetermined order, to a different position on a pupil plane of the target optical system, the introducing step including the step of scanning the light in a radial direction in the pupil plane of the target optical system, detecting a imaging position of the light introduced by the introducing step, on an image plane of the target optical system, and obtaining the optical characteristic of the target optical system based on a detection result of the detecting step.

Inventors: Shiode; Yoshihiro (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: G01B 9/00 (20060101)

Expiration Date: 2019-11-02 0:00:00