Patent Number: 7,957,917

Title: Copper contamination detection method and system for monitoring copper contamination

Abstract: A computer system. The computer system including a processor and memory unit coupled to the processor, the memory unit containing instructions that when executed by the processor implement a method for monitoring a solution in a tank used to fabricate integrated circuits, the method comprising the computer implemented steps of: (a) collecting data indicating of an amount of copper in a region of a substrate of a monitor, the monitor comprising an N-type region in a silicon substrate, the region abutting a top surface of the substrate, the monitor having been submerged in the solution for a preset time; (b) comparing the data to a specification for copper content of the solution; (c) if the data indicates a copper content exceeds a limit of the specification for copper, indicating a corrective action is required to prevent copper contamination of the integrated circuits; and (d) repeating steps (a) through (c) periodically.

Inventors: Burnham; Jay Sanford (Fletcher, VT), Comeau; Joseph Kerry Vaughn (Essex Junction, VT), Crane; Leslie Peter (Williston, VT), Elliott; James Randall (Richmond, VT), Estes; Scott Alan (Essex Junction, VT), Nakos; James Spiros (Essex Junction, VT), White; Eric Jeffrey (Charlotte, VT)

Assignee: International Business Machines Corporation

International Classification: G01N 30/04 (20060101)

Expiration Date: 2019-06-07 0:00:00