Patent Number: 7,972,764

Title: Electron beam writing method, fine pattern writing system, method for manufacturing uneven pattern carrying substrate, and method for manufacturing magnetic disk medium

Abstract: When writing elements of a fine pattern on a substrate applied with a resist by scanning an electron beam on the substrate, the electron beam is scan controlled so as to completely fill the shape of each of the elements by vibrating the electron beam rapidly in a radius direction of the rotation stage and at the same time deflecting in a direction orthogonal to the radius direction of the rotation stage faster than a rotational speed thereof, thereby sequentially writing the elements.

Inventors: Komatsu; Kazunori (Odawara, JP), Usa; Toshihiro (Odawara, JP)

Assignee: Fujifilm Corporation

International Classification: G03C 5/00 (20060101)

Expiration Date: 2019-07-05 0:00:00