Patent Number: 8,066,893

Title: Method for creating a magnetic write pole having a stepped perpendicular pole via CMP-assisted liftoff

Abstract: A method for manufacturing a magnetic write head having a stepped, recessed, high magnetic moment pole connected with a write pole. The stepped pole structure helps to channel magnetic flux to the write pole without leaking write field to the magnetic medium. This allows the write head to maintain a high write field strength at very small bit sizes. The method includes depositing a dielectric layer and a first CMP layer over substrate that can include a magnetic shaping layer. A mask is formed over the dielectric layer, the mask having an opening to define the stepped pole structure. The image of the mask is transferred into the dielectric layer. A high magnetic moment material is deposited and a chemical mechanical polishing is performed to planarize the magnetic material and dielectric layer.

Inventors: Baer; Amanda (Campbell, CA), Hsiao; Wen-Chien David (San Jose, CA), Kim; John I. (San Jose, CA), Liu; Yinshi (Foster City, CA), Nikitin; Vladimir (Campbell, CA), Olson; Trevor W. (San Jose, CA), Sougrati; Hicham Moulay (Burlingame, CA), Yao; Yuan (Fremont, CA)

Assignee: Hitachi Global Storage Technologies Netherlands B.V.

International Classification: B44C 1/22 (20060101); B23P 15/00 (20060101)

Expiration Date: 2020-11-29 0:00:00