Patent Number: 8,070,967

Title: Method for manufacturing patterned magnetic recording medium

Abstract: A method for manufacturing a patterned magnetic recording medium that allows processing only required sites with high precision, in a dry etching process during formation of an uneven pattern in an interlayer. The method includes forming sequentially, on a substrate, a soft magnetic layer, an etching stop layer, a seed layer, an interlayer, a hard mask layer and a resist; obtaining a resist pattern by patterning the resist; obtaining a patterned hard mask layer by etching the hard mask layer using the resist pattern as a mask; stripping the resist pattern; obtaining a patterned interlayer by etching the interlayer using the patterned hard mask layer as a mask; stripping the patterned hard mask layer; and forming a magnetic recording layer by forming a perpendicular orientation section on the patterned interlayer, and forming a random orientation section on the seed layer.

Inventors: Taniguchi; Katsumi (Matsumoto, JP)

Assignee: Fuji Electric Co., Ltd.

International Classification: B44C 1/22 (20060101); C03C 15/00 (20060101); B23P 15/00 (20060101)

Expiration Date: 2020-12-06 0:00:00