Patent Number: 8,089,613

Title: Lithographic apparatus, excimer laser and device manufacturing method

Abstract: A CD-pitch dependency for a lithographic pattern printing process is related to the spectral intensity distribution of radiation used for projecting the pattern. A CD-pitch dependency can vary from one system to another. This can result in an iso-dense bias mismatch between systems. The invention addresses this problem by providing a lithographic apparatus including an illumination system for providing a projection beam of radiation, a projection system for projecting a patterned beam onto a target portion of a substrate, and a substrate table for holding the substrate, with a controller to provide an adjustment of the spectral distribution of radiant intensity of the projection beam. The adjustment of the spectral intensity distribution is based on data relating to an iso dense bias, and comprises a broadening of the spectral bandwidth or a change of shape of the spectral intensity distribution.

Inventors: De Kruif; Robertus Cornelis Martinus (Eindhoven, NL), Bruls; Richard Joseph (Eindhoven, NL), Teeuwsen; Johannes Wilhelmus Maria Cornelis (Helmond, NL), Buurman; Erik Petrus (Veldhoven, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/54 (20060101); G03B 27/42 (20060101)

Expiration Date: 2020-01-03 0:00:00