Patent Number: 8,298,751

Title: Alkaline rinse agents for use in lithographic patterning

Abstract: Lithographic patterning methods involve the formation of a (one or more) metal oxide capping layer, which is rinsed with an aqueous alkaline solution as part of the method. The rinse solution does not damage the capping layer, but rather allows for lithographic processing without thinning the capping layer or introducing defects into it. Ammoniated water is a preferred rinse solution, which advantageously leaves behind no nonvolatile residue.

Inventors: Hinsberg; William D. (San Jose, CA), Wallraff; Gregory Michael (San Jose, CA)

Assignee: International Business Machines Corporation

International Classification: G03F 7/26 (20060101)

Expiration Date: 2020-10-30 0:00:00