Patent Number: 8,303,722

Title: Water and method for storing silicon wafer

Abstract: There is provided a storage water of a silicon wafer wherein a liquid temperature of the storage water is 0 to 18.degree. C. And there is provided a shower water of a silicon wafer wherein a liquid temperature of the shower water is 0 to 18.degree. C. The wafer is stored in the storage water, and showered using the shower water. The present invention also relates to a method for storing silicon wafer wherein the silicon wafer is showered using a shower water of which liquid temperature is 0 to 18.degree. C., and is then stored in liquid using a storage water of which liquid temperature is 0 to 18.degree. C. Thereby, there can be provided a water for storing a silicon wafer, a method for storing it, a water for showering it and a method for showering it wherein degradation of the wafer quality can be prevented.

Inventors: Abe; Tatsuo (Fukushima, JP), Kanazawa; Kenichi (Fukushima, JP), Miyashita; Akira (Fukushima, JP), Kashimura; Norio (Fukushima, JP)

Assignee: Shin-Etsu Handotai Co., Ltd.

International Classification: B08B 7/00 (20060101); B08B 3/00 (20060101); B08B 7/04 (20060101)

Expiration Date: 2021-11-06 0:00:00