Patent Number: 8,318,030

Title: Magnetic device definition with uniform biasing control

Abstract: A method of fabricating a magnetic device is described. A mask removing layer is formed on a layered sensing stack and a hard mask layer is formed on the mask removing layer. A first reactive ion etch is performed with a non-oxygen-based chemistry to define the hard mask layer using an imaged layer formed on the hard mask layer as a mask. A second reactive ion etch is performed with an oxygen-based chemistry to define the mask removing stop layer using the defined hard mask layer as a mask. A third reactive ion etch is performed to define the layered sensing stack using the hard mask layer as a mask. The third reactive ion etch includes an etching chemistry that performs at a lower etching rate on the hard mask layer than on the layered sensing stack.

Inventors: Peng; Xilin (Bloomington, MN), Wakeham; Stacey C. (Bloomington, MN), Zhang; Yifan (Eden Prairie, MN), Wang; Zhongyan (San Ramon, CA), Nikolaev; Konstantin R. (Edina, MN), Ostrowski; Mark Henry (Lakeville, MN), Chen; Yonghua (Edina, MN), Ding; Juren (Eden Prairie, MN)

Assignee: Seagate Technology LLC

International Classification: B44C 1/22 (20060101)

Expiration Date: 2021-11-27 0:00:00