Patent Number: 8,574,926

Title: Magnetic memory and manufacturing method thereof

Abstract: According to one embodiment, a manufacturing method of a magnetic memory includes forming a magnetoresistive element in a cell array section on a semiconductor substrate, forming a dummy element in a peripheral circuit section on the semiconductor substrate, the dummy element having the same stacked structure as the magnetoresistive element and being arranged at the same level as the magnetoresistive element, collectively flattening the magnetoresistive element and the dummy element, applying a laser beam to the dummy element to form the dummy element into a non-magnetic body, and forming an upper electrode on the flattened magnetoresistive element.

Inventors: Noma; Kenji (Yokohama, JP), Watanabe; Hiroshi (Yokohama, JP), Kobayashi; Shinya (Yokohama, JP)

Assignee: Kabushiki Kaisha Toshiba

International Classification: H01L 21/00 (20060101)

Expiration Date: 1/05/12017