Patent Number: 8,574,941

Title: Method for manufacturing solid-state imaging device

Abstract: A method for manufacturing a solid-state imaging device in which a charge generator that detects an electromagnetic wave and generates signal charges is formed on a semiconductor substrate and a negative-charge accumulated layer having negative fixed charges is formed above a detection plane of the charge generator. The method includes the steps of: forming an oxygen-feed film capable of feeding oxygen on the detection plane of the charge generator; forming a metal film that covers the oxygen-feed film on the detection plane of the charge generator; and performing heat treatment for the metal film in an inactive atmosphere to thereby form an oxide of the metal film between the metal film and the oxygen-feed film on the detection plane of the charge generator, the oxide being to serve as the negative-charge accumulated layer.

Inventors: Hiyama; Susumu (Kanagawa, JP), Hirano; Tomoyuki (Kanagawa, JP)

Assignee: Sony Corporation

International Classification: H01L 31/103 (20060101)

Expiration Date: 1/05/12017