Patent Number: 8,717,535

Title: SLM calibration

Abstract: Apparatus and methods are used to calibrate an array of individually controllable elements within a lithographic apparatus. A calibration unit can switch between a first state in which the modulated beam of radiation passes into a projection system for projecting the modulated beam of radiation onto a substrate and a second state in which a portion of the modulated beam of radiation is inspected by the calibration unit. The calibration unit generates calibration data, or alternatively, updates calibration data, based on the inspection of the modulated beam of radiation. An array controller uses the calibration data to provide control signals to elements of an array of individually controllable elements, which are subsequently configured in response to the control signals.

Inventors: Visser; Huibert (Zevenhuizen, NL), Hoeks; Martinus Hendricus Hendricus (Breugel, NL), Kruizinga; Borgert (Zoetermeer, NL), Streefkerk; Bob (Tilburg, NL), Tinnemans; Patricius Aloysius Jacobus (Hapert, NL), Van Zwet; Erwin John (Pijnacker, NL), Vanneer; Roeland Nicolaas Maria (Eindhoven, NL), Meijerink; Marcus Gerhardus Hendrikus (The Hague, NL), Van Der Valk; Nicolaas Cornelis Johannes (Zoetermeer, NL), Van Himbergen; Har (The Hague, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/42 (20060101)

Expiration Date: 5/06/12018