Patent Number: 8,743,165

Title: Methods and device for laser processing

Abstract: The present invention relates to laser ablation microlithography. In particular, we disclose a new SLM design and patterning method that uses multiple mirrors per pixel to concentrate energy to an energy density that facilitates laser ablation, while keeping the energy density on the SLM mirror surface at a level that does not damage the mirrors. Multiple micro-mirrors can be reset at a very high frequency, far beyond current DMD devices.

Inventors: Sandstrom; Torbjorn (Pixbo, SE)

Assignee: Micronic Laser Systems AB

International Classification: G02B 26/00 (20060101); B23K 26/00 (20060101); B41J 2/455 (20060101); B41J 2/447 (20060101); G03F 7/20 (20060101); G02B 27/10 (20060101); G02B 26/08 (20060101)

Expiration Date: 2022-06-03 0:00:00