Patent Number: 8,795,478

Title: Method for manufacturing perpendicular magnetic recording medium

Abstract: Embodiments of the invention provide a manufacturing method which permits a high quality perpendicular magnetic recording medium to be manufactured with a high yield by preventing abnormal discharge which sputters particles from the target. In one embodiment, while the perpendicular magnetic recording medium is formed, DC pulses are applied to the target. During the reversal period (Reversal Time) between sputtering periods, a voltage of the opposite polarity is applied. During the sputtering period, a negative voltage is applied which biases the target surface to a negative potential, causing Ar+ to collide with and sputter CoCrPt and SiO.sub.2 for deposition on the intermediate layer. The top surface of the insulation material (SiO.sub.2) on the target is charged by Ar+ to have a voltage larger than the target voltage. However, arcing can be prevented since the charge on the surface of the insulation material is neutralized due to a positive voltage applied to the target during the non-sputtering period.

Inventors: Honda; Yoshinori (Kanagawa-ken, JP), Ichihara; Takayuki (Tokyo, JP), Nakagawa; Hiroyuki (Kanagawa, JP), Tanahashi; Kiwamu (Tokyo, JP)

Assignee: HGST Netherlands B.V.

International Classification: C23C 14/00 (20060101); C23C 14/32 (20060101); G11B 5/66 (20060101)

Expiration Date: 8/05/12018