Patent Number: 8,795,929

Title: Pellicle having buffer zone and photomask structure having pellicle

Abstract: A pellicle including a frame having a square shape; and a buffer zone in the frame, the buffer zone dividing a lower surface of the frame into a plurality of portions.

Inventors: Kim; Sung-Hyuck (Yongin-si, KR), Shin; In-Kyun (Yongin-si, KR), An; Bum-Hyun (Hwaseong-si, KR)

Assignee: Samsung Electronics Co., Ltd.

International Classification: G03F 1/00 (20120101)

Expiration Date: 8/05/12018