Patent Number: 8,796,540

Title: Method of manufacturing substrate for photovoltaic cell

Abstract: A method of manufacturing a substrate for a photovoltaic cell, in which the high optical characteristic in a long-wavelength range available for the photovoltaic cell can be maintained, and at the same time, the amount of hazing can be increased. The method includes the step of forming a zinc oxide (ZnO) thin film layer doped with a dopant on a transparent substrate, and the step of controlling the surface structure of the zinc oxide thin film layer by etching the zinc oxide thin film layer using hydrogen plasma.

Inventors: Yoo; YoungZo (ChungCheongNam-Do, KR), Kim; SeoHyun (ChungCheongNam-Do, KR), Yoon; Gun Sang (ChungCheongNam-Do, KR)

Assignee: Samsung Corning Precision Materials Co., Ltd.

International Classification: H01L 31/18 (20060101)

Expiration Date: 8/05/12018