Patent Number: 8,796,769

Title: Thermal flux annealing influence of buried species

Abstract: A method including introducing a species into a substrate including semiconductor material; and translating linearly focused electromagnetic radiation across a surface of the substrate, the electromagnetic radiation being sufficient to thermally influence the species. An apparatus including an electromagnetic radiation source; a stage having dimensions suitable for accommodating a semiconductor substrate within a chamber; an optical element disposed between the electromagnetic radiation source and the stage to focus radiation from the electromagnetic radiation source into a line having a length determined by the diameter of a substrate to be placed on the stage; and a controller coupled to the electromagnetic radiation source including machine readable program instructions that allow the controller to control the depth into which a substrate is exposed to the radiation.

Inventors: Jennings; Dean C. (Beverly, MA), Al-Bayati; Amir (San Jose, CA)

Assignee: Applied Matierials, Inc.

International Classification: H01L 21/336 (20060101)

Expiration Date: 8/05/12018