Patent Number: 8,815,012

Title: Emissivity profile control for thermal uniformity

Abstract: A substrate for processing in a heating system is disclosed. The substrate includes a bottom portion for absorbing heat from a radiating heat source, the bottom portion having a first region having a first emissivity and a second region having a second emissivity less than the first emissivity. The first region and the second region promote thermal uniformity of the substrate by compensating for thermal non-uniformity of the radiating heat source.

Inventors: Kelekar; Rajesh (Los Altos, CA)

Assignee: Intermolecular, Inc.

International Classification: H05B 6/10 (20060101)

Expiration Date: 8/26/12018