Patent Number: 8,815,108

Title: Method of depositing localized coatings

Abstract: A method of depositing a non-continuous coating of a first material on a substrate, comprising: a) the formation of a mask on this substrate, by forming at least two mask layers, and etching of at least one cavity in these layers, this cavity having an outline such that a coating, deposited on the substrate, through the cavities of the mask, has at least one discontinuity over said outline of the cavity; b) the deposition of the first material on the substrate, through the cavities of the mask, the coating thus deposited having at least one discontinuity over the outline of said cavity; and c) the mask is removed.

Inventors: Remiat; Bruno (Paris, FR), Vandroux; Laurent (Le Cheylas, FR), Souche; Florent (St Laurent du Pont, FR)

Assignee: Commissariat a l'Energie Atomique

International Classification: C03C 15/00 (20060101); C03C 25/68 (20060101); H01L 21/311 (20060101); H01L 21/461 (20060101); H01L 21/302 (20060101)

Expiration Date: 8/26/12018