Patent Number: 8,815,336

Title: Magnetic recording medium manufacturing method

Abstract: According to one embodiment, there is provided a magnetic recording medium manufacturing method including forming a resist layer on a magnetic recording layer, patterning the resist layer, forming a magnetic pattern by performing ion implantation through the resist layer, partially modifying the surface of the magnetic recording layer, removing the resist, applying a self-organization material to the surface of the magnetic recording layer and forming a dotted mask pattern, and patterning the magnetic recording layer.

Inventors: Kimura; Kaori (Yokohama, JP), Sakurai; Masatoshi (Tokyo, JP), Kashiwagi; Kazuto (Yokohama, JP), Takeo; Akihiko (Kokubunji, JP)

Assignee: Kabushiki Kaisha Toshiba

International Classification: B05D 5/12 (20060101)

Expiration Date: 8/26/12018