Patent Number: 8,815,477

Title: Color filter manufacturing method, patterned substrate manufacturing method, and small photomask

Abstract: A color filter manufacturing method for forming a filter segment and a black matrix by repeating at least a coating step of coating a substrate with a photosensitive resin layer, a pattern exposure step of curing the photosensitive resin layer by pattern exposure, a developing step of developing the exposed photosensitive resin layer, and a sintering step of thermosetting the developed photosensitive resin layer, in this order a plurality of number of times, characterized in that in the exposure step, a laser is used as a light source, and proximity exposure is performed by repetitively emitting the laser via photomask such that a cumulative exposure amount is 1 to 150 mJ/cm.sup.2.

Inventors: Ikeda; Takeshi (Tokyo, JP), Aoki; Eishi (Tokyo, JP), Harada; Genki (Tokyo, JP)

Assignee: Toppan Printing Co., Ltd.

International Classification: G03F 7/20 (20060101); G02B 5/20 (20060101)

Expiration Date: 8/26/12018