Patent Number: 8,817,235

Title: Lithographic apparatus and method involving a pockels cell

Abstract: A lithographic apparatus is disclosed that includes an illumination system configured to condition a beam of radiation, the illumination system having a Pockels cell arranged to control the polarization of the radiation beam, and an array of individually controllable reflective elements arranged to control the pupil plane distribution of the radiation beam.

Inventors: Tinnemans; Patricius Aloysius Jacobus (Hapert, NL), Baselmans; Johannes Jacobus Matheus (Oirschot, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/72 (20060101); G03B 27/54 (20060101); G03B 27/32 (20060101)

Expiration Date: 8/26/12018