Patent Number: 8,817,237

Title: Spectral purity filter, lithographic apparatus, and method for manufacturing a spectral purity filter

Abstract: A method of forming a spectral purity filter having a plurality of apertures configured to transmit extreme ultraviolet radiation and suppress transmission of a second type of radiation, in which trenches are formed in a base material in a pattern corresponding to the walls to be formed between the apertures. The trenches are filled with a grid material to form walls of the grid material, and the base material is selectively removed until the grid material is exposed and forms the spaces between the walls of the grid material for the apertures.

Inventors: Soer; Wouter Anthon (Nijmegen, NL), Jak; Martin Jacobus Johan (Eindhoven, NL), Dekker; Ronald (Valkenswaard, NL)

Assignee: ASML Netherlands B.V.

International Classification: G03B 27/32 (20060101); G03B 27/72 (20060101)

Expiration Date: 8/26/12018