Patent Number: 8,821,098

Title: Load port

Abstract: A load port is disclosed which allows a wafer to be transferred between the inside of a FOUP and the inside of a semiconductor fabrication apparatus even during a purge operation. The load port is provided adjacent the semiconductor fabrication apparatus in a clean room and includes a purge stage having a purge port through which a gas atmosphere in the FOUP is replaced into nitrogen gas or dry air, an opener stage provided in a juxtaposed relationship with the purge stage and having an opening communicating with the inside of the semiconductor fabrication apparatus and a door section capable of opening and closing the opening, and a moving mechanism for moving the FOUP between the purge stage and the opener stage.

Inventors: Natsume; Mitsuo (Toyohashi, JP), Kawahisa; Shin (Minato-ku, JP), Mizokawa; Takumi (Toyohashi, JP)

Assignee: Sinfonia Technology Co., Ltd.

International Classification: H01L 21/677 (20060101)

Expiration Date: 9/02/12018