Patent Number: 8,822,251

Title: Micro electro mechanical system, semiconductor device, and manufacturing method thereof

Abstract: The present invention provides a MEMS and a sensor having the MEMS which can be formed without a process of etching a sacrifice layer. The MEMS and the sensor having the MEMS are formed by forming an interspace using a spacer layer. In the MEMS in which an interspace is formed using a spacer layer, a process for forming a sacrifice layer and an etching process of the sacrifice layer are not required. As a result, there is no restriction on the etching time, and thus the yield can be improved.

Inventors: Yamaguchi; Mayumi (Kanagawa, JP), Izumi; Konami (Kanagawa, JP), Tateishi; Fuminori (Kanagawa, JP)

Assignee: Semiconductor Energy Laboratory Co., Ltd.

International Classification: H01L 21/00 (20060101); H01L 21/30 (20060101); H01L 21/46 (20060101)

Expiration Date: 9/02/12018