Patent Number: 8,822,346

Title: Method and apparatus for self-aligned layer removal

Abstract: A reaction block having a plurality of reaction chambers defined therein is provided. A bottom surface of each of the reaction chambers is configured to provide a seal for a corresponding reaction region on the substrate and around a periphery of the substrate. The reaction block includes a plurality of inlet channels and provides a gap between a top surface of the substrate and a bottom surface of the reaction block. The gap accepts a fluid from the inlet channels, wherein the reaction block includes a plurality of vacuum channels having access to the bottom surface of the reaction block to remove the fluid from the gap. A method of selectively etching a substrate for combinatorial processing is also provided.

Inventors: Weiner; Kurt (San Jose, CA)

Assignee: Intermolecular, Inc.

International Classification: H01L 21/302 (20060101); C25F 3/00 (20060101); C03C 15/00 (20060101); C03C 25/68 (20060101); H01L 21/461 (20060101); B44C 1/22 (20060101)

Expiration Date: 9/02/12018