Patent Number: 8,822,353

Title: Systems and methods for forming a time-averaged line image

Abstract: Systems and methods for forming a time-averaged line image having a relatively high amount of intensity uniformity along its length is disclosed. The method includes forming at an image plane a line image having a first amount of intensity non-uniformity in a long-axis direction and forming a secondary image that at least partially overlaps the primary image. The method also includes scanning the secondary image over at least a portion of the primary image and in the long-axis direction according to a scan profile to form a time-average modified line image having a second amount of intensity non-uniformity in the long-axis direction that is less than the first amount. For laser annealing a semiconductor wafer, the amount of line-image overlap for adjacent scans of a wafer scan path is substantially reduced, thereby increasing wafer throughput.

Inventors: Anikitchev; Serguei (Belmont, CA), McWhirter; James T. (San Jose, CA), Gortych; Joseph E. (Sarasota, FL)

Assignee: Ultratech, Inc.

International Classification: B23K 26/00 (20140101); H01L 21/268 (20060101); B23K 26/073 (20060101)

Expiration Date: 9/02/12018