Patent Number: 8,822,960

Title: Charged particle beam drawing apparatus and article manufacturing method using same

Abstract: The charged particle beam drawing apparatus of the present invention is a charged particle beam drawing apparatus that renders a pattern on a substrate using a charged particle beam and includes a detector that detects charge amount depending on the irradiation of the charged particle beam; first and second deflectors that are arranged along the direction of the irradiation of the charged particle beam and are capable of deflecting the charged particle beam; and a controller that controls the first and second deflectors, wherein the controller transmits a signal, which is used for switching the irradiation/nonirradiation of the charged particle beam to the detector, to the first and second deflectors at a predetermined timing, and adjusts the operation timing of the first and second deflectors based on the output of the detector depending on the signal.

Inventors: Ozawa; Kimitaka (Utsunomiya, JP)

Assignee: Canon Kabushiki Kaisha

International Classification: H01J 37/28 (20060101)

Expiration Date: 9/02/12018