Patent Number: 8,823,921

Title: Programmable illuminator for a photolithography system

Abstract: A programmable illuminator for a photolithography system includes a light source, a first optical system having a light uniformizing element, a programmable micro-mirror device, and a second optical system that forms an illumination field that illuminates a reticle. The programmable micro-mirror device can be configured to perform shutter and edge-exposure-blocking functions that have previously required relatively large mechanical devices. Methods of improving illumination field uniformity using the programmable illuminator are also disclosed.

Inventors: Zlatanov; Borislav (San Jose, CA), Hawryluk; Andrew M. (Los Altos, CA)

Assignee: Ultratech, Inc.

International Classification: G03B 27/54 (20060101)

Expiration Date: 9/02/12018