Patent Number: 8,870,795

Title: Method and apparatus for analyzing gait pattern

Abstract: A method and apparatus for recognizing a gait pattern are provided. The method for recognizing a gate pattern includes: obtaining a walker's foot pressure distribution values through a pressure sensor array disposed at the bottom of a pair of shoes; calculating valid pressure points among the foot pressure distribution values; calculating a center of pressure (COP) movement trace by using the valid pressure points; and recognizing the walker's gait pattern by using the COP movement trace.

Inventors: Kim; Min Ho (Daejeon, KR), Jung; Ho Youl (Daejeon, KR), Park; Soo Jun (Seoul, KR)

Assignee: Electronics and Telecommunications Research Institute

International Classification: A61B 5/103 (20060101); A61B 5/117 (20060101)

Expiration Date: 2018-10-28 0:00:00