Patent Number: 8,871,153

Title: Mechanically fluidized silicon deposition systems and methods

Abstract: Mechanically fluidized systems and processes allow for efficient, cost-effective production of silicon. Particulate may be provided to a heated tray or pan, which is oscillated or vibrated to provide a reaction surface. The particulate migrates downward in the tray or pan and the reactant product migrates upward in the tray or pan as the reactant product reaches a desired state. Exhausted gases may be recycled.

Inventors: Dassel; Mark W. (Indianola, WA), Bressler; David A. (Indianola, WA)

Assignee: Rokstar Technologies LLC

International Classification: B01J 8/18 (20060101)

Expiration Date: 2018-10-28 0:00:00