Patent Number: 8,872,427

Title: Plasma generating apparatus

Abstract: A plasma generating apparatus includes: a power supply one of whose electrodes is connected to vacuum chamber walls of N vacuum chambers; an oscillator which outputs a pulse signal at every predetermined period; N pulse amplifying circuits which are connected in parallel to the oscillator as well as to the other electrode of the power supply, and each of which amplifies the pulse signal and supplies the amplified pulse signal to a corresponding one of N electrodes disposed in the N vacuum chambers; and at least (N-1) timing generating circuits which are connected between the oscillator and at least (N-1) pulse amplifying circuits, and which delay the pulse signal by respectively different delay times so that at any specific time, the pulse signal is supplied to only one of the pulse amplifying circuits.

Inventors: Itomura; Daisuke (Chiryu, JP), Tera; Ryonosuke (Kariya, JP), Hirokawa; Yasuaki (Nagoya, JP), Nagaya; Hayato (Chiryu, JP)

Assignee: Denso Corporation

International Classification: H01J 7/24 (20060101)

Expiration Date: 2018-10-28 0:00:00