Patent Number: 8,877,424

Title: Monomer, polymer, resist composition, and patterning process

Abstract: A polymer is prepared from an adamantane methacrylate monomer whose alcoholic hydroxyl group is protected with an alicyclic-containing tertiary alkyl group. A photoresist composition comprising the polymer displays a high sensitivity and a high dissolution contrast during both alkaline development and organic solvent development.

Inventors: Sagehashi; Masayoshi (Joetsu, JP), Hatakeyama; Jun (Joetsu, JP), Hasegawa; Koji (Joetsu, JP), Katayama; Kazuhiro (Joetsu, JP)

Assignee: Shin-Etsu Chemical Co., Ltd.

International Classification: G03F 7/039 (20060101); G03F 7/38 (20060101); G03F 7/004 (20060101); G03F 7/20 (20060101); G03F 7/30 (20060101)

Expiration Date: 2019-11-04 0:00:00