Patent Number: 8,878,129

Title: Pattern measurement apparatus and pattern measurement method

Abstract: According to one embodiment, a pattern measurement apparatus includes a scan controller, a focus controller, a stage, a sensor, a signal processor, and a measurement unit. The scan controller is configured to control a scanning direction of an electron beam. The focus controller is configured to control a focus position of the electron beam. The stage is configured to have a substrate placed on the stage, a pattern being provided in the substrate. The sensor is configured to sense secondary electrons due to the electron beam irradiated onto the pattern. The signal processor is configured to process a signal sensed by the sensor. The signal processor is configured to determine at least one of third signals from at least one of first signals and at least one of second signals. The measurement unit is configured to measure a position of the pattern from the third signals.

Inventors: Kasa; Kentaro (Kanagawa-ken, JP)

Assignee: Kabushiki Kaisha Toshiba

International Classification: H01J 37/28 (20060101)

Expiration Date: 2019-11-04 0:00:00