Patent Number: 8,881,068

Title: Optimized optical proximity correction handling for lithographic fills

Abstract: An approach for providing a fragmentation scheme for lithographic fills is provided. In a typical embodiment, a plurality of shapes in a lithographic (e.g., dummy) fill will be grouped/classified into a first set of shapes (e.g., a representative set of shapes) and a second set of shapes (e.g., a similar set of shapes). A set of points will be identified along the edges of the first set of shapes (e.g., at corners of the edges and at positions along the edges that are in alignment with corners of adjacent shapes) to yield an initial mask output. This initial mask output will be copied to the second set of shapes to yield a final mask output which may then be outputted using such an optimized fragmentation scheme.

Inventors: Bashaboina; Pavan (Fremont, CA), McGowan; Sarah (San Francisco, CA)


International Classification: G06F 17/50 (20060101)

Expiration Date: 2019-11-04 0:00:00