Patent Number: 8,881,069

Title: Process enhancing safe SRAF printing using etch aware print avoidance

Abstract: A method of SRAF printing using etch-aware SRAF print avoidance engines and the resulting device are provided. Embodiments include performing mask to resist simulations for a mask having both a plurality of features to be formed on a substrate and a plurality of sub resolution assist features (SRAFs); detecting SRAFs of the plurality that will print through to a resist; checking dimensions of the detected SRAFs to determine whether one or more of the SRAFs will etch through to the substrate; modifying the one or more of the SRAFs; and forming the mask after the one or more of the SRAFs have been modified.

Inventors: Hamouda; Ayman (Fishkill, NY)


International Classification: G06F 17/50 (20060101)

Expiration Date: 2019-11-04 0:00:00