Patent Number: 8,881,072

Title: Method for compensating for variations in structures of an integrated circuit

Abstract: A method of for compensating for variations in structures of an integrated circuit. The method includes (a) selecting a mask design shape and selecting a region of the mask design shape; (b) applying a model-based optical proximity correction to all of the mask design shape; and after (b), (c) applying a rules-based optical proximity correction to the selected region of the mask design shape.

Inventors: Credendino; Santo (Raleigh, NC), Hulvey; Michael D. (Shelburne, VT), Kuppusamy; Jothimalar (Chennai, IN), Leidy; Robert Kenneth (Burlington, VT), Pastel; Paul William (Essex, VT), Porth; Bruce Walter (Jericho, VT), Stamper; Anthony K. (Williston, VT)

Assignee: International Business Machines Corporation

International Classification: G06F 17/50 (20060101)

Expiration Date: 2019-11-04 0:00:00